Characterisation of aluminium oxynitride gas barrier films

被引:110
作者
Erlat, AG
Henry, BM
Ingram, JJ
Mountain, DB
McGuigan, A
Howson, RP
Grovenor, CRM
Briggs, GAD
Tsukahara, Y
机构
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[2] Loughborough Univ Technol, Dept Phys, Loughborough LE11 3TU, Leics, England
[3] Toppan Printing Co Ltd, Tech Res Inst, Sugito, Saitama 345, Japan
关键词
gas barrier films; Reactive magnetron sputtering; aluminium oxynitride; Poly (ethylene terepthalate);
D O I
10.1016/S0040-6090(01)00836-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the last decade, metal oxide layers deposited on polymer substrates have been utilised as gas barrier films in food packaging as an alternative to the traditional aluminium foil. The resistance of these composite films to gas transmission is controlled predominantly by nano-scale defects created during the fabrication of the oxide layer. The size and density of these defects are believed to be strongly dependent on the intrinsic properties of the metal oxide laver. Changing the chemical composition of these coatings is one possible method to enhance the gas barrier properties of the films. In this work, aluminium oxynitride films, fabricated by reactive magnetron sputtering on Poly (ethylene terephthalate) substrates, have been investigated using a range of analytical techniques including: scanning proton microprobe; atomic force microscopy; scanning electron microscopy; transmission electron microscopy; uni-axial tensile testing; and gas permeation measurements to characterise the gas barrier properties of the film. The structural observations have been correlated with the measurements of the oxygen and water vapour permeation of the composite. Oxygen transmission rates as low as 1 cm(-3)/m(2) day . atm and water vapour transmission rates below 0.2 g/m(2) day have been measured. and these competitive values can be explained by the relatively low density of defects in the barrier layers. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:78 / 86
页数:9
相关论文
共 38 条
[1]   ION ASSISTED DEPOSITION OF OXYNITRIDES OF ALUMINUM AND SILICON [J].
ALJUMAILY, GA ;
MOONEY, TA ;
SPURGEON, WA ;
DAUPLAISE, HM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :2280-2285
[2]   ATOMIC-FORCE MICROSCOPY AND PERMEABILITY STUDY OF STRETCHING-INDUCED GAS BARRIER LOSS OF ALOX LAYERS [J].
BARKER, CP ;
KOCHEM, KH ;
REVELL, KM ;
KELLY, RSA ;
BADYAL, JPS .
THIN SOLID FILMS, 1995, 259 (01) :46-52
[3]   Inorganic coatings on polymers [J].
Benmalek, M ;
Dunlop, HM .
SURFACE & COATINGS TECHNOLOGY, 1995, 76-77 (1-3) :821-826
[4]  
Chan HL, 1997, MATER RES SOC SYMP P, V441, P487
[5]   Oxygen diffusion barrier properties of transparent oxide coatings on polymeric substrates [J].
Chatham, H .
SURFACE & COATINGS TECHNOLOGY, 1996, 78 (1-3) :1-9
[6]  
DANNENBERG R, 1999, P SOC VAC COAT SOC 4, P181
[7]   AN ALUMINUM OXYNITRIDE FILM [J].
DEHUANG, W ;
LIANG, G .
THIN SOLID FILMS, 1991, 198 (1-2) :207-210
[8]   OPTICAL AND ELECTRICAL CHARACTERIZATIONS OF LASER CHEMICAL-VAPOR-DEPOSITED ALUMINUM OXYNITRIDE FILMS [J].
DEMIRYONT, H ;
THOMPSON, LR ;
COLLINS, GJ .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (09) :3235-3240
[9]   Statistical evaluation of refractive index, growth rate, hardness and Young's modulus of aluminium oxynitride films [J].
Dreer, S ;
Krismer, R ;
Wilhartitz, P ;
Friedbacher, G .
THIN SOLID FILMS, 1999, 354 (1-2) :43-49
[10]   Multidimensional optimisation of process parameters by experimental design for the deposition of aluminium and silicon oxynitride films with predictable composition [J].
Dreer, S ;
Krismer, R ;
Wilhartitz, P .
SURFACE & COATINGS TECHNOLOGY, 1999, 114 (01) :29-38