Guest Editorial Special Issue on Plasma-Assisted Technologies February 2020

被引：1

作者：

Matveev, Igor ^{[1
]}

Lopez, Jose L. ^{[2
]}

机构：

[1] Appl Plasma Technol LLC, Mclean, VA 22101 USA

[2] Seton Hall Univ, Dept Phys, S Orange, NJ 07079 USA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2020年 / 48卷 / 02期

关键词：

D O I：

10.1109/TPS.2020.2972075

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

引用

页码：329 / 331

页数：3

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