Electron and hole traps in the carbon doping of n-type GaN films grown by metal-organic chemical vapor deposition were investigated by deep level and minority carrier transient spectroscopies. Four electron traps were observed in the samples. Of these traps, the electron trap concentration of E2 (Ec - 0.40 eV) rose with increasing C incorporation. Two hole traps H1 (Ev + 0.86 eV) and H2 also showed the dependence of C doping concentration. According to these results, traps E2, H1, and H2 correspond to C-related defects. Moreover, the energy level of H1 was consistent with an ionization energy of 0.9 eV of C-N acting as a deep acceptor, which might give rise to conventional yellow luminescence and current collapse of GaN-based high electron mobility transistors (HEMTs). This was confirmed by photoluminescence (PL) spectra that the integrated intensity of yellow luminescence (YL) band was largely dependent on C incorporation. Therefore, we speculated that hole trap H1 might be responsible for a broad YL band in the samples. (C) 2012 The Japan Society of Applied Physics
机构:
Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Fang, Z-Q
Claflin, B.
论文数: 0引用数: 0
h-index: 0
机构:
Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Claflin, B.
Look, D. C.
论文数: 0引用数: 0
h-index: 0
机构:
Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Look, D. C.
Green, D. S.
论文数: 0引用数: 0
h-index: 0
机构:
RF Micro Devices Inc, Def & Power, Charlotte, NC 28269 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Green, D. S.
Vetury, R.
论文数: 0引用数: 0
h-index: 0
机构:
RF Micro Devices Inc, Def & Power, Charlotte, NC 28269 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
机构:
Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Fang, Z-Q
Claflin, B.
论文数: 0引用数: 0
h-index: 0
机构:
Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Claflin, B.
Look, D. C.
论文数: 0引用数: 0
h-index: 0
机构:
Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Look, D. C.
Green, D. S.
论文数: 0引用数: 0
h-index: 0
机构:
RF Micro Devices Inc, Def & Power, Charlotte, NC 28269 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
Green, D. S.
Vetury, R.
论文数: 0引用数: 0
h-index: 0
机构:
RF Micro Devices Inc, Def & Power, Charlotte, NC 28269 USAWright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA