In this paper, we improved the performance of a near-infrared graphene/germanium heterojunction photodetector at atmospheric pressure and at room temperature. We applied graphene with p-type chemical doping (doping chemical: polyacrylic acid) to lower the graphene Fermi level and increase the Schottky barrier formed at the junction with Ge. The responsivity at 1550 nm is improved from 0.87 to 1.27 A/W after the doping process. At the same time, the dark current is reduced by 20 times and the detectivity of the optimized device is improved to 9.6 x 10(9) Jones, which is 540% improvement compared to the undoped graphene device. With the result of improving performance through this simple process, it will be able to contribute to the fabrication of highly reactive graphene/semiconductor based photodetectors and the development of near-infrared sensors. (c) 2022 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
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Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Zhao, B.
Zhao, J. M.
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Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Harbin Inst Technol, Sch Energy Sci & Engn, Harbin 150006, Peoples R ChinaGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Zhao, J. M.
Zhang, Z. M.
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Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
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Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Xu, Anli
Yang, Siwei
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Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200500, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Yang, Siwei
Liu, Zhiduo
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Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Liu, Zhiduo
Li, Gongjin
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Fudan Univ, Dept Mat Sci, Shanghai 200433, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Li, Gongjin
Li, Jiurong
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Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Li, Jiurong
Li, Ya
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Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Li, Ya
Chen, Da
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Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Chen, Da
Guo, Qinglei
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Fudan Univ, Dept Mat Sci, Shanghai 200433, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Guo, Qinglei
Wang, Gang
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Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Wang, Gang
Ding, Guqiao
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Ningbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200500, Peoples R ChinaNingbo Univ, Fac Sci, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China