Diamond growth on WC-Co substrates by hot filament chemical vapor deposition: Effect of filament-substrate separation

被引:49
作者
Wei, Qiuping [1 ,2 ,3 ]
Ashfold, Michael N. R. [2 ]
Mankelevich, Yu A. [4 ]
Yu, Z. M. [1 ]
Liu, P. Z. [1 ]
Ma, L. [3 ]
机构
[1] Cent S Univ, Sch Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
[2] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England
[3] Cent S Univ, State Key Lab Powder Met, Changsha 410083, Hunan, Peoples R China
[4] Moscow MV Lomonosov State Univ, Skobeltsyn Inst Nucl Phys, Moscow 119991, Russia
关键词
CVD diamond films; Hot filament chemical vapor deposition (HFCVD); Filament-substrate distance; Raman spectroscopy; Gas phase modeling; RAMAN-SCATTERING; NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMOND; THIN-FILMS; CVD; SPECTRUM; STRESS; MODEL; 1ST-ORDER; SPECTROSCOPY;
D O I
10.1016/j.diamond.2011.02.017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Polycrystalline diamond films have been grown by hot filament (HF) chemical vapor deposition on WC-Co bar substrates using different CH4/H-2 source gas mixing ratios and two different total gas pressures. Each substrate was mounted so as to span a range of HF-substrate separations, d(f), (and thus substrate temperatures) and therefore samples a spread of incident gas phase chemistry and compositions. Spatially resolved scanning electron microscopy and Raman analysis of the deposited material provides a detailed picture of the evolution of film morphology, growth rate, sp(3)/sp(2) content and stress with df in each deposited sample, and of how these properties vary with process conditions. The experimental study is complemented by two-dimensional model calculations of the HF-activated gas phase chemistry and composition, which succeeds in reproducing the measured growth rates well. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:641 / 650
页数:10
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