Degradation of chloramphenicol in water by oxidation on a boron-doped diamond electrode under UV irradiation

被引:21
|
作者
Ennouri, Rawdha [1 ]
Lavecchia, Roberto [2 ]
Zuorro, Antonio [2 ]
Elaoud, Sourour C. [1 ]
Petrucci, Elisabetta [2 ]
机构
[1] Univ Sfax, Lab Physicochim, Dept Chim, Fac Sci Sfax, Sfax 3000, Tunisia
[2] Sapienza Univ Rome, Dept Chem Engn Mat & Environm, Via Eudossiana 18, I-00184 Rome, Italy
关键词
Chloramphenicol; Antibiotic removal; Boron-doped diamond; Advanced oxidation processes; UV; ANTIBIOTIC CHLORAMPHENICOL; ELECTROCHEMICAL OXIDATION; CURRENT KNOWLEDGE; ANODIC-OXIDATION; WASTE-WATER; ENVIRONMENT; KINETICS; MINERALIZATION; POLLUTANTS; REDUCTION;
D O I
10.1016/j.jwpe.2021.101995
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
A combined advanced oxidation process based on the electrochemical oxidation of chloramphenicol (CHL) on a boron-doped diamond (BDD) electrode under UV irradiation was investigated. The influence of the main process parameters (current density, pH, temperature, and chloride concentration) on CHL degradation and mineralization was assessed. An estimation of the energy consumption required to mineralize CHL was also made. The results showed that CHL can be completely degraded and extensively mineralized by 3-h UV-assisted anodic oxidation on BDD. The process can be further accelerated by chlorides, as these species act as precursors for the photo-induced formation of radical species contributing to CHL oxidation. Under optimal conditions (300 mA m(-2), 0.01 M NaCl, ambient temperature, and pH 10), complete CHL removal occurred after 150 min of treatment, and approximately 95 % mineralization was achieved in 180 min. Overall, the results obtained suggest that the investigated process may represent a promising approach to treat wastewaters containing CHL or other recalcitrant antibiotics.
引用
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页数:9
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