Improved stability of amorphous silicon solar cells with p-type nanocrystalline silicon carbide window layer

被引:6
作者
Chang, Ping-Kuan [1 ]
Hsu, Wei-Tse [2 ]
Hsieh, Po-Tsung [3 ]
Lu, Chun-Hsiung [2 ]
Yeh, Chih-Hung [2 ]
Houng, Mau-Phon [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 701, Taiwan
[2] NexPower Technol Corp, Taichung 421, Taiwan
[3] Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Tainan 701, Taiwan
关键词
P-nc-SiC:H; Window layer; a-Si:H solar cell; Light induced degradation; CHEMICAL-VAPOR-DEPOSITION; THIN-FILM SILICON; HYDROGEN DILUTION; I-LAYER; MICROCRYSTALLINE; SI; EFFICIENCY; DEGRADATION; DEPENDENCE; MHZ;
D O I
10.1016/j.tsf.2011.11.082
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, a concept to mitigate light-induced degradation of thin film silicon solar cells is systematically demonstrated. To overcome the light-induced degradation of hydrogenated amorphous silicon (a-Si:H) p-i-n solar cells, conventional p-type hydrogenated amorphous silicon-carbide (p-a-SiC:H) layer is replaced by the p-type nanocrystalline silicon carbide (p-nc-SiC:H). Current-voltage characteristics of solar cells fabricated with p-nc-SiC:H layers are evaluated. The introduction of a p-nc-SiC:H layer as a window layer for a-Si:H solar cells improves the light soaking degradation ratio from 24.6% to 15.9% compared to a-Si:H solar cells with a conventional p-a-SiC:H layers. Although the initial efficiency with p-nc-SiC:H layers is not as high as the standard a-Si:H solar cell with p-a-SiC:H layers, the stabilized efficiency of a-Si:H solar cell with p-nc-SiC:H window layer (8.0%) still exceeds that of the standard a-Si:H cell (7.7%). (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:3096 / 3099
页数:4
相关论文
共 22 条
[1]   Relationship between Raman crystallinity and open-circuit voltage in microcrystalline silicon solar cells [J].
Droz, C ;
Vallat-Sauvain, E ;
Bailat, J ;
Feitknecht, L ;
Meier, J ;
Shah, A .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2004, 81 (01) :61-71
[2]   Light-soaking stability of silicon thin film solar cells using alternately hydrogenated dilution method [J].
Ito, M ;
Shimizu, S ;
Kondo, M ;
Matsuda, A .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 :698-701
[3]   The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition [J].
Kim, HY ;
Lee, KY ;
Lee, JY .
THIN SOLID FILMS, 1997, 302 (1-2) :17-24
[4]   Novel aspects in thin film silicon solar cells-amorphous, microcrystalline and nanocrystalline silicon [J].
Kondo, M ;
Matsuda, A .
THIN SOLID FILMS, 2004, 457 (01) :97-102
[5]   Performance and stability of Si:H p-i-n solar cells with i layers prepared at the thickness-dependent amorphous-to-microcrystalline phase boundary [J].
Koval, RJ ;
Koh, J ;
Lu, Z ;
Jiao, L ;
Collins, RW ;
Wronski, CR .
APPLIED PHYSICS LETTERS, 1999, 75 (11) :1553-1555
[6]   Light-induced changes in hydrogen-diluted a-Si:H materials and solar cells: A new perspective on self-consistent analysis [J].
Lee, Y ;
Jiao, L ;
Liu, H ;
Lu, Z ;
Collins, RW ;
Wronski, CR .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1997, 49 (1-4) :149-156
[7]   Improvement of μc-Si:H n-i-p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profiling [J].
Li, H. ;
Franken, R. H. ;
Stolk, R. L. ;
van der Werf, C. H. M. ;
Rath, J. K. ;
Schropp, R. E. I. .
THIN SOLID FILMS, 2008, 516 (05) :755-757
[8]   Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate [J].
Matsuda, A ;
Takai, M ;
Nishimoto, T ;
Kondo, M .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2003, 78 (1-4) :3-26
[9]   Electrode distance dependence of photo-induced degradation in hydrogenated amorphous silicon [J].
Miyahara, H ;
Takai, M ;
Nishimoto, T ;
Kondo, M ;
Matsuda, A .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2002, 74 (1-4) :351-356
[10]   Highly conductive microcrystalline silicon carbide films deposited by the hot wire cell method and its application to amorphous silicon solar cells [J].
Miyajima, S ;
Yamada, A ;
Konagai, M .
THIN SOLID FILMS, 2003, 430 (1-2) :274-277