Focused ion beam induced deposition of superconducting thin films

被引:14
|
作者
Sadki, ES [1 ]
Ooi, S [1 ]
Hirata, K [1 ]
机构
[1] Natl Inst Mat Sci, Superconduct Mat Ctr, Tsukuba, Ibaraki 3050047, Japan
关键词
FIB; IBID; thin films; superconducting devices;
D O I
10.1016/j.physc.2005.02.151
中图分类号
O59 [应用物理学];
学科分类号
摘要
Superconducting thin films have been deposited using gallium focused ion beam with tungsten carboxyl W(CO)6 as precursor. The composition of the films is investigated by electron probe microanalysis (EPMA), which shows atomic concentrations of about 40%, 40%, and 20% of tungsten, carbon, and gallium, respectively. From resistivity and magnetic measurements, the superconducting critical temperature is 5.2 K. Furthermore, the upper critical fields and coherence length, are deduced from resistivity data measured at different applied magnetic fields, and have zero Kelvin values of 9.5 T and 5.9 nm, respectively. This technique can be used as a template-free fabrication method for superconducting circuits and devices. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1547 / 1551
页数:5
相关论文
共 50 条
  • [31] ION CLUSTER BEAM DEPOSITION OF THIN-FILMS
    BROWN, WL
    JARROLD, MF
    MCEACHERN, RL
    SOSNOWSKI, M
    TAKAOKA, G
    USUI, H
    YAMADA, I
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 182 - 189
  • [32] Ion beam sputter deposition of zirconia thin films
    Jin Weihua
    Jin Chunshui
    Liu Lei
    Zhu Hongli
    Yang Huaijiang
    INTERNATIONAL SYMPOSIUM ON PHOTOELECTRONIC DETECTION AND IMAGING 2007: OPTOELECTRONIC SYSTEM DESIGN, MANUFACTURING, AND TESTING, 2008, 6624
  • [34] Focused-Ion-Beam Direct-Writing of Ultra-Thin Superconducting Tungsten Composite Films
    Li, Wuxia
    Fenton, Jon C.
    Warburton, Paul A.
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2009, 19 (03) : 2819 - 2822
  • [35] FOCUSED-ION BEAM-INDUCED DEPOSITION OF COPPER
    DELLARATTA, AD
    MELNGAILIS, J
    THOMPSON, CV
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2195 - 2199
  • [36] Focused ion beam induced deposition of platinum for repair processes
    Tao, Tao
    Wilkinson, William
    Melngailis, John
    Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 1991, 9 (01): : 162 - 164
  • [37] A MACROSCOPIC MODEL FOR FOCUSED-ION-BEAM-INDUCED DEPOSITION
    OVERWIJK, MHF
    VANDENHEUVEL, FC
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (03) : 1762 - 1769
  • [39] Investigation of the Shadow Effect in Focused Ion Beam Induced Deposition
    Fang, Chen
    Xing, Yan
    NANOMATERIALS, 2022, 12 (06)
  • [40] Optimization of the chemical vapor deposition induced focused ion beam
    Choi, HZ
    Kang, EG
    Lee, SW
    Hong, WP
    ADVANCES IN ABRASIVE TECHNOLOGY VIII, 2005, 291-292 : 413 - 418