Effect of image charges in the drain delay of AlGaN/GaN high electron mobility transistors

被引:18
作者
Chung, J. W. [1 ]
Zhao, X. [1 ]
Wu, Y. -R. [2 ]
Singh, J. [2 ]
Palacios, T. [1 ]
机构
[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
关键词
D O I
10.1063/1.2889498
中图分类号
O59 [应用物理学];
学科分类号
摘要
The drain delay in AlGaN/GaN submicron high electron mobility transistors (HEMTs) accounts for almost 25% of the total electron delay. This long delay significantly limits the maximum frequency performance and linearity of these devices. This paper studies the origin of this important delay assuming that it is inversely proportional to alpha, a parameter related to how injected channel electrons image at different contacts in the HEMT. Through analysis and two-dimensional simulations, we have found that alpha equals 3 in a standard HEMT. This value has been confirmed experimentally through the coupling of Monte Carlo simulations and drain delay measurements. (c) 2008 American Institute of Physics.
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页数:3
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