Characterization of pure water-treated GaAs surfaces by measuring contact angles of water droplets

被引：3

作者：

Matsushita, K ^{[1
]}

Fujisawa, A ^{[1
]}

Ando, N ^{[1
]}

Kobayashi, H ^{[1
]}

Naganuma, H ^{[1
]}

Okuyama, S ^{[1
]}

Okuyama, K ^{[1
]}

机构：

[1] Yamagata Univ, Fac Engn, Dept Elect Engn, Yonezawa, Yamagata 9928510, Japan

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2001年 / 148卷 / 08期

关键词：

D O I：

10.1149/1.1381392

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A GaAs surface treated with pure water was characterized by using contact angle measurement, Auger electron spectroscopy, and atomic force microscopy. The contact angle was found to be dependent on treatment conditions such as treatment time, agitation of pure water, dissolved oxygen concentration in pure water, and illumination. The contact angle of a water droplet on GaAs surface treated with agitated deionized pure water was found to increase with increasing treatment time, indicating that the hydrophobicity of the surface increased. The agitation of pure water strongly influenced the oxygen concentration and the roughness of the treated GaAs surface, and hence, the contact angle of a water droplet on it. (C) 2001 The Electrochemical Society. [DOI: 10.114911.1381392] All rights reserved.

引用

页码：G401 / G405

页数：5

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