Chemical and physical sputtering of aluminium and gold samples using Ar-H2 DC-glow discharges

被引:14
作者
Budtz-Jorgensen, CV [1 ]
Kringhoj, P [1 ]
Nielsen, JF [1 ]
Bottiger, J [1 ]
机构
[1] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
关键词
glow discharge mass spectroscopy; direct current; glow discharge sputtering; reactive sputtering; argon; hydrogen;
D O I
10.1016/S0257-8972(00)01085-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present a series of sputtering experiments on aluminium samples performed with an Ar-H, DC-glow discharge at varying Ar-H, gas-composition, driven at a discharge voltage of -300 V and a pressure of 0.2 mbar, in conjunction with measurements of the corresponding ion-energy distributions of the ions bombarding the discharge cathode (Ar+, Ar2+, ArH+, H-2(+); and H-3(+)). Similar measurements on gold samples, which have been published, have shown that the Au-sputtering efficiency of an Ar-H-2 glow discharge as a function of gas-composition could be adequately described by the corresponding change in the measured ion-energy distributions, under the assumption of a purely physical sputtering process. The experiments presented here show that this is not the case for aluminium (effectively Al2O3). In this case, a measured optimal gas-composition of 80% H-2 was found for Al-sputtering, while the energy-distributions suggest an optimum at 20% (as for gold). This clearly suggests that hydrogen-enhanced chemical sputtering is taking place. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:299 / 306
页数:8
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