Low-dark-current large-area narrow-band photodetector using InGaN/GaN layers on sapphire

被引:9
作者
Ohsawa, J
Kozawa, T
Hayashi, H
Fujishima, O
Itoh, H
机构
[1] Toyota Technol Inst, Tempaku Ku, Nagoya, Aichi 4688511, Japan
[2] Toyota Cent R&D Labs Inc, Nagakute, Aichi 4801192, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2005年 / 44卷 / 20-23期
关键词
photodetector; InGaN; 400; nm; nitride; MSM; leakage current; impulse response;
D O I
10.1143/JJAP.44.L623
中图分类号
O59 [应用物理学];
学科分类号
摘要
A metal-semiconductor-metal structure was fabricated on a 20-nm-thick InGaN layer, and showed a responsivity of over 0.1 A/W to the wavelength of 400 nm at a bias of I V. The photocurrent was almost linear to the power of the incident light in three decades. The Schottky interdigital electrodes kept the dark current to less than 100 pA at 10 V despite its large detecting area of 1 mm(2). The device showed fast responses on the order of 10 ns to optical impulses from a 407 nm laser diode. Biasing at 1 V or lower is effective in suppressing the sensitivity in the wavelength range shorter than 350 run when illuminated from the substrate side through a 2-mu m-thick GaN layer, resulting in a narrow-band detector for the 400 run band.
引用
收藏
页码:L623 / L625
页数:3
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