QUANTUM HALL EFFECT QUANTIZATION TESTS IN EXFOLIATED BILAYER AND MONOLAYER GRAPHENE

被引:0
|
作者
Guignard, J. [1 ]
Schopfer, F. [1 ]
Poirier, W. [1 ]
Glattli, D. C. [2 ]
机构
[1] Lab Natl Metrol & Essais, Quantum Metrol Grp, F-78197 Trappes, France
[2] CEA Saclay, Serv Phys Etat Condense, F-91191 Gif Sur Yvette, France
来源
2010 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS CPEM | 2010年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on quantization tests of the quantum Hall effect in monolayer and bilayer graphene based devices which are fabricated from natural graphite by micromechanical exfoliation. Measurements of the Hall resistance R-H with relative uncertainties in the range of 10(-7) performed using a cryogenic current comparator based resistance bridge have been combined with high-precision longitudinal resistance R-xx measurements to demonstrate that the quantization of R-H in such graphene based devices agrees with the theoretical prediction with a relative accuracy of about 2 parts in 10(7). For a BL sample, the characterizations which have been carried out reveal the existence of nu=-4 Hall resistance plateau flat within 2 parts in 10(6) over a finite range of electron density. At the center of the plateau, the Hall resistance agrees with R-K/4 within 1.5 part in 10(7). Besides, a sample fabricated from a ML was also characterized: an agreement between the Hall resistance and R-K/2 on the nu=2 plateau within 3 parts in 10(7) has been demonstrated.
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页码:577 / +
页数:2
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