Blending approaches to enhance structural order in block-copolymer's self-assemblies.

Various blends approaches based on PS-b-PMMA block-copolymers (BCP) systems are studied. The impacts of the different components in the blends on various basic characteristics of interest for lithographic applications are highlighted. More specifically, we show how such approaches can be managed to get a tight control over the different dimensions of the self-assembly, and reach lower defects levels than a single pure BCP. These methods could greatly help the BCP self-assembly technology to be introduced as an actual lithographic technic to further reduce achievable dimensions.