Coloration of tungsten oxide electrochromic thin films at high bias potentials and low intercalation levels

被引:1
|
作者
Rojas-Gonzalez, Edgar A. [1 ]
Niklasson, Gunnar A. [1 ]
机构
[1] Uppsala Univ, Dept Mat Sci & Engn, Angstrom Lab, POB 534, SE-75121 Uppsala, Sweden
基金
瑞典研究理事会;
关键词
Amorphous materials; Sputtering; Optical materials and properties;
D O I
10.1016/j.mlblux.2020.100048
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The optical absorption of amorphous tungsten oxide thin films was studied at low intercalation levels. The electronic density of states was obtained by an electrochemical method and bias potential regions were assigned to the conduction band and gap states according to the experimentally estimated conduction band edge. Differences between the coloration in the conduction band and gap states were observed when comparing the experimental results to a theoretical site-saturation model that considers electronic transitions between localized tungsten sites. The model could reproduce the optical response due to conduction band states. However, it underestimated the rate of change of the optical absorption coefficient with intercalation level for gap states. This discrepancy is discussed in the context of small-polaron optical absorption. (C) 2020 The Author(s). Published by Elsevier B.V.
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页数:3
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