Influence of an Annealing Temperature in a Vacuum Atmosphere on the Physical Properties of Indium Tin Oxide Nanorod Films

被引:1
作者
Charoenyuenyao, Peerasil [1 ]
Promros, Nathaporn [1 ]
Chaleawpong, Rawiwan [1 ]
Noymaliwan, Pitoon [1 ]
Borwornpornmetee, Nattakorn [1 ]
Kamoldilok, Surachart [1 ]
Porntheeraphat, Supanit [2 ]
Saekow, Bunpot [2 ]
Chaikeeree, Tanapoj [3 ]
Samransuksamer, Benjarong [4 ]
Nuchuay, Peerapong [3 ]
Chananonnawathorn, Chanunthorn [3 ]
Limwichean, Saksorn [3 ]
Horprathum, Mati [3 ]
Eiamchai, Pitak [3 ]
Patthanasettakul, Viyapol [3 ]
机构
[1] King Mongkuts Inst Technol Ladkrabang, Fac Sci, Dept Phys, Bangkok 10520, Thailand
[2] Natl Elect & Comp Technol Ctr NECTEC, Photon Technol Lab, Pathum Thani 12120, Thailand
[3] Natl Elect & Comp Technol Ctr NECTEC, Opt Thin Film Lab, Pathum Thani 12120, Thailand
[4] King Mongkuts Univ Technol Thonburi, Fac Sci, Dept Phys, Bangkok 10140, Thailand
关键词
ITO Nanorod Films; Vacuum Annealing; Ion-Assisted Electron-Beam Evaporation; Glancing Angle Deposition; Physical Properties; ELECTRON-BEAM EVAPORATION; ITO THIN-FILMS; OPTICAL-PROPERTIES; LIGHT-EXTRACTION; ENHANCEMENT; SURFACE; DEPOSITION; ZNO; TRANSMISSION; WETTABILITY;
D O I
10.1166/jnn.2020.17840
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In the present study, indium tin oxide (ITO) nanorod films were produced by usage of ion-assisted electron-beam evaporation with a glancing angle deposition technique. The as-produced ITO nanorod films were annealed in the temperature range of 100-500 degrees C for two hours in a vacuum atmosphere. The as-produced ITO nanorod films exhibited (222) and (611) preferred orientations from the X-ray diffraction pattern. After vacuum annealing at 500 degrees C, the ITO nanorod films demonstrated many preferred orientations and the improvement of film crystallinity. The sheet resistance of the as-produced ITO nanorod films was 11.92 Omega/square and was found to be 13.63 Omega/square by annealing at 500 degrees C. The as-produced and annealed ITO nanorod films had a rod diameter of around 80 nm and transmittance in a visible zone of around 90%. The root mean square roughness of the as-produced ITO nanorod film's surface was 5.49 nm, which increased to 13.77 nm at an annealing temperature of 500 degrees C. The contact angle of the as-produced ITO nanorod films was 110.9 degrees and increased to 116.5 degrees after annealing at 500 degrees C.
引用
收藏
页码:5006 / 5013
页数:8
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