共 17 条
[2]
Critical issues in 157 nm lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1998, 16 (06)
:3154-3157
[3]
ARRAYED MINIATURE ELECTRON-BEAM COLUMNS FOR HIGH THROUGHPUT SUB-100 NM LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1992, 10 (06)
:2743-2748
[4]
Extreme ultraviolet lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1998, 16 (06)
:3142-3149
[5]
SOFT-X-RAY PROJECTION LITHOGRAPHY USING AN X-RAY REDUCTION CAMERA
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1988, 6 (06)
:2162-2166
[6]
HERGENROTHER JM, 1999, P INT ELECT DEV M
[7]
KAMON K, 1991, JPN J APPL PHYS PT 1, V30, P3012
[8]
Kim BG, 2000, SOLID STATE TECHNOL, V43, P107
[9]
Levenson MD, 1997, PROC SPIE, V3051, P2
[10]
LEVINSON MD, 1982, IEEE T ELECTRON DEV, V29, P1828