Perpendicularly oriented barium ferrite thin films with low microwave loss, prepared by pulsed laser deposition

Barium ferrite (BaM) thin films are deposited on platinum coated silicon wafers by pulsed laser deposition (PLD). The effects of deposition substrate temperature on the microstructure, magnetic and microwave properties of BaM thin films are investigated in detail. It is found that microstructure, magnetic and microwave properties of BaM thin film are very sensitive to deposition substrate temperature, and excellent BaM thin film is obtained when deposition temperature is 910 degrees C and oxygen pressure is 300 mTorr (1 Torr = 1.3332 x 10(2) Pa). X-ray diffraction patterns and atomic force microscopy images show that the best thin film has perpendicular orientation and hexagonal morphology, and the crystallographic alignment degree can be calculated to be 0.94. Hysteresis loops reveal that the squareness ratio (Mr/Ms) is as high as 0.93, the saturated magnetization is 4004 Gs (1 Gs = 10(4) T), and the anisotropy field is 16.5 kOe (1 Oe = 79.5775 A.m(-1)). Ferromagnetic resonance measurements reveal that the gyromagnetic ratio is 2.8 GHz/kOe, and the ferromagnetic resonance linewith is 108 Oe at 50 GHz, which means that this thin film has low microwave loss. These properties make the BaM thin films have potential applications in microwave devices.