共 30 条
Effect of Li-doping on low temperature solution-processed indium-zinc oxide thin film transistors
被引:24
作者:

Han, Soo-Yeun
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Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea

Manh-Cuong Nguyen
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Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea

An Hoang Thuy Nguyen
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Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea

Choi, Jae-Won
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Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea

Kim, Jung-Youn
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Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea

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[1] Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea
来源:
基金:
新加坡国家研究基金会;
关键词:
Indium zinc oxide;
Oxide semiconductor;
Solution metal oxide;
Lithium;
Thin film transistor;
HIGH-PERFORMANCE;
ROOM-TEMPERATURE;
MOBILITY;
D O I:
10.1016/j.tsf.2017.05.024
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Lithium (Li)-doped indium zinc oxide (IZO) thin film transistors (TFTs) were fabricated on solution-processed zirconium oxide gate dielectrics using a low temperature all solution process. Li-doping in IZO thin films led to higher crystallinity, even at process temperature lower than 300 degrees C, and to the formation of favorable oxidation states of metal ions. The results were confirmed by electrical property analysis of the Li-doped IZO TFTs. For Li content varied from 0 to 16.6 at.%, the highest field-effect mobility, on/off current ratio, subthreshold slope and stress bias stability were obtained for Li-doping concentration of 9.0 mol%. (C) 2017 Elsevier B.V. All rights reserved.
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页码:19 / 23
页数:5
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共 30 条
[1]
A review on the recent developments of solution processes for oxide thin film transistors
[J].
Ahn, Byung Du
;
Jeon, Hye-Ji
;
Sheng, Jiazhen
;
Park, Jozeph
;
Park, Jin-Seong
.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY,
2015, 30 (06)

Ahn, Byung Du
论文数: 0 引用数: 0
h-index: 0
机构:
Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea

Jeon, Hye-Ji
论文数: 0 引用数: 0
h-index: 0
机构:
Hanyang Univ, Div Mat Sci & Engn, Seoul 133719, South Korea Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea

Sheng, Jiazhen
论文数: 0 引用数: 0
h-index: 0
机构:
Hanyang Univ, Div Mat Sci & Engn, Seoul 133719, South Korea Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea

Park, Jozeph
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Daejeon 305701, South Korea Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea

论文数: 引用数:
h-index:
机构:
[2]
Inkjet Printed, High Mobility Inorganic-Oxide Field Effect Transistors Processed at Room Temperature
[J].
Dasgupta, Subho
;
Kruk, Robert
;
Mechau, Norman
;
Hahn, Horst
.
ACS NANO,
2011, 5 (12)
:9628-9638

Dasgupta, Subho
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany

Kruk, Robert
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany

Mechau, Norman
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany

Hahn, Horst
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany
Tech Univ Darmstadt, KIT TUD Joint Res Lab Nanomat, Inst Mat Sci, D-64287 Darmstadt, Germany
Karlsruhe Inst Technol, CFN, D-76131 Karlsruhe, Germany Karlsruhe Inst Technol KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany
[3]
Enhancement of Electrical Stability in IGZO Thin-Film Transistors Inserted with an IZO Layer Grown by Atomic Layer Deposition
[J].
Ding, Xingwei
;
Li, Sheng
;
Song, Jiantao
;
Zhang, Jianhua
;
Jiang, Xueyin
;
Zhang, Zhilin
.
JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS,
2017, 12 (03)
:273-277

Ding, Xingwei
论文数: 0 引用数: 0
h-index: 0
机构:
Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
Shanghai Univ, Sch Mechatron & Automat, Shanghai 200072, Peoples R China Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China

Li, Sheng
论文数: 0 引用数: 0
h-index: 0
机构:
Shanghai Univ, Sch Mechatron & Automat, Shanghai 200072, Peoples R China Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China

Song, Jiantao
论文数: 0 引用数: 0
h-index: 0
机构:
Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China

Zhang, Jianhua
论文数: 0 引用数: 0
h-index: 0
机构:
Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
Shanghai Univ, Sch Mechatron & Automat, Shanghai 200072, Peoples R China Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China

Jiang, Xueyin
论文数: 0 引用数: 0
h-index: 0
机构:
Shanghai Univ, Dept Mat Sci, Shanghai 200072, Peoples R China Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China

Zhang, Zhilin
论文数: 0 引用数: 0
h-index: 0
机构:
Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
Shanghai Univ, Dept Mat Sci, Shanghai 200072, Peoples R China Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
[4]
Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances
[J].
Fortunato, E.
;
Barquinha, P.
;
Martins, R.
.
ADVANCED MATERIALS,
2012, 24 (22)
:2945-2986

Fortunato, E.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Nova Lisboa, CENIMAT I3N, Dept Ciencia Mat, Fac Ciencias & Tecnol,FCT, P-2829516 Caparica, Portugal
CEMOP UNINOVA, P-2829516 Caparica, Portugal Univ Nova Lisboa, CENIMAT I3N, Dept Ciencia Mat, Fac Ciencias & Tecnol,FCT, P-2829516 Caparica, Portugal

Barquinha, P.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Nova Lisboa, CENIMAT I3N, Dept Ciencia Mat, Fac Ciencias & Tecnol,FCT, P-2829516 Caparica, Portugal
CEMOP UNINOVA, P-2829516 Caparica, Portugal Univ Nova Lisboa, CENIMAT I3N, Dept Ciencia Mat, Fac Ciencias & Tecnol,FCT, P-2829516 Caparica, Portugal

Martins, R.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Nova Lisboa, CENIMAT I3N, Dept Ciencia Mat, Fac Ciencias & Tecnol,FCT, P-2829516 Caparica, Portugal
CEMOP UNINOVA, P-2829516 Caparica, Portugal Univ Nova Lisboa, CENIMAT I3N, Dept Ciencia Mat, Fac Ciencias & Tecnol,FCT, P-2829516 Caparica, Portugal
[5]
Low-temperature preparation of (002)-oriented ZnO thin films by sol-gel method
[J].
Guo, Dongyun
;
Sato, Kuninori
;
Hibino, Shingo
;
Takeuchi, Tetsuya
;
Bessho, Hisami
;
Kato, Kazumi
.
THIN SOLID FILMS,
2014, 550
:250-258

Guo, Dongyun
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan

Sato, Kuninori
论文数: 0 引用数: 0
h-index: 0
机构:
Tokai Rubber Ind LTD, Komaki, Japan Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan

Hibino, Shingo
论文数: 0 引用数: 0
h-index: 0
机构:
Tokai Rubber Ind LTD, Komaki, Japan Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan

Takeuchi, Tetsuya
论文数: 0 引用数: 0
h-index: 0
机构:
Tokai Rubber Ind LTD, Komaki, Japan Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan

Bessho, Hisami
论文数: 0 引用数: 0
h-index: 0
机构:
Tokai Rubber Ind LTD, Komaki, Japan Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan

Kato, Kazumi
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan
[6]
Low-Temperature, High-Performance, Solution-Processed Indium Oxide Thin-Film Transistors
[J].
Han, Seung-Yeol
;
Herman, Gregory S.
;
Chang, Chih-hung
.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
2011, 133 (14)
:5166-5169

Han, Seung-Yeol
论文数: 0 引用数: 0
h-index: 0
机构:
Oregon State Univ, Sch Chem Biol & Environm Engn, Corvallis, OR 97331 USA Oregon State Univ, Sch Chem Biol & Environm Engn, Corvallis, OR 97331 USA

Herman, Gregory S.
论文数: 0 引用数: 0
h-index: 0
机构:
Oregon State Univ, Sch Chem Biol & Environm Engn, Corvallis, OR 97331 USA Oregon State Univ, Sch Chem Biol & Environm Engn, Corvallis, OR 97331 USA

论文数: 引用数:
h-index:
机构:
[7]
An 'aqueous route' for the fabrication of low-temperature-processable oxide flexible transparent thin-film transistors on plastic substrates
[J].
Hwang, Young Hwan
;
Seo, Jin-Suk
;
Yun, Je Moon
;
Park, HyungJin
;
Yang, Shinhyuk
;
Park, Sang-Hee Ko
;
Bae, Byeong-Soo
.
NPG ASIA MATERIALS,
2013, 5
:e45-e45

Hwang, Young Hwan
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

Seo, Jin-Suk
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

Yun, Je Moon
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

Park, HyungJin
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

Yang, Shinhyuk
论文数: 0 引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Oxide Elect Res Team, Taejon 305606, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

Park, Sang-Hee Ko
论文数: 0 引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Oxide Elect Res Team, Taejon 305606, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

Bae, Byeong-Soo
论文数: 0 引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[8]
Emerging Device Applications for Semiconducting Two-Dimensional Transition Metal Dichalcogenides
[J].
Jariwala, Deep
;
Sangwan, Vinod K.
;
Lauhon, Lincoln J.
;
Marks, Tobin J.
;
Hersam, Mark C.
.
ACS NANO,
2014, 8 (02)
:1102-1120

论文数: 引用数:
h-index:
机构:

Sangwan, Vinod K.
论文数: 0 引用数: 0
h-index: 0
机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA

Lauhon, Lincoln J.
论文数: 0 引用数: 0
h-index: 0
机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA

Marks, Tobin J.
论文数: 0 引用数: 0
h-index: 0
机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Northwestern Univ, Dept Chem, Evanston, IL 60208 USA Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA

Hersam, Mark C.
论文数: 0 引用数: 0
h-index: 0
机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
Northwestern Univ, Dept Med, Evanston, IL 60208 USA Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[9]
Enhanced mobility of Li-doped ZnO thin film transistors fabricated by mist chemical vapor deposition
[J].
Jeon, Hye-ji
;
Lee, Seul-Gi
;
Kim, H.
;
Park, Jin-Seong
.
APPLIED SURFACE SCIENCE,
2014, 301
:358-362

Jeon, Hye-ji
论文数: 0 引用数: 0
h-index: 0
机构:
Hanyang Univ, Div Mat Sci & Engn, Seoul 133719, South Korea Hanyang Univ, Div Mat Sci & Engn, Seoul 133719, South Korea

Lee, Seul-Gi
论文数: 0 引用数: 0
h-index: 0
机构:
Hanyang Univ, Div Mat Sci & Engn, Seoul 133719, South Korea Hanyang Univ, Div Mat Sci & Engn, Seoul 133719, South Korea

论文数: 引用数:
h-index:
机构:

论文数: 引用数:
h-index:
机构:
[10]
Origin of the improved mobility and photo-bias stability in a double-channel metal oxide transistor
[J].
Jung, Hong Yoon
;
Kang, Youngho
;
Hwang, Ah Young
;
Lee, Chang Kyu
;
Han, Seungwu
;
Kim, Dae-Hwan
;
Bae, Jong-Uk
;
Shin, Woo-Sup
;
Jeong, Jae Kyeong
.
SCIENTIFIC REPORTS,
2014, 4

Jung, Hong Yoon
论文数: 0 引用数: 0
h-index: 0
机构:
Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Kang, Youngho
论文数: 0 引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 151742, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Hwang, Ah Young
论文数: 0 引用数: 0
h-index: 0
机构:
Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Lee, Chang Kyu
论文数: 0 引用数: 0
h-index: 0
机构:
Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Han, Seungwu
论文数: 0 引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea
Seoul Natl Univ, Res Inst Adv Mat, Seoul 151742, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Kim, Dae-Hwan
论文数: 0 引用数: 0
h-index: 0
机构:
LG Display Co, R&D Ctr, Paju Si 413811, Kyonggi Do, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Bae, Jong-Uk
论文数: 0 引用数: 0
h-index: 0
机构:
LG Display Co, R&D Ctr, Paju Si 413811, Kyonggi Do, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Shin, Woo-Sup
论文数: 0 引用数: 0
h-index: 0
机构:
LG Display Co, R&D Ctr, Paju Si 413811, Kyonggi Do, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea

Jeong, Jae Kyeong
论文数: 0 引用数: 0
h-index: 0
机构:
Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea Inha Univ, Dept Mat Sci & Engn, Inchon 402751, South Korea