Effect of Li-doping on low temperature solution-processed indium-zinc oxide thin film transistors

被引:24
作者
Han, Soo-Yeun [1 ]
Manh-Cuong Nguyen [1 ]
An Hoang Thuy Nguyen [1 ]
Choi, Jae-Won [1 ]
Kim, Jung-Youn [1 ]
Choi, Rino [1 ]
机构
[1] Inha Univ, Dept Mat Sci & Engn, 100 Inha Ro, Incheon, South Korea
基金
新加坡国家研究基金会;
关键词
Indium zinc oxide; Oxide semiconductor; Solution metal oxide; Lithium; Thin film transistor; HIGH-PERFORMANCE; ROOM-TEMPERATURE; MOBILITY;
D O I
10.1016/j.tsf.2017.05.024
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Lithium (Li)-doped indium zinc oxide (IZO) thin film transistors (TFTs) were fabricated on solution-processed zirconium oxide gate dielectrics using a low temperature all solution process. Li-doping in IZO thin films led to higher crystallinity, even at process temperature lower than 300 degrees C, and to the formation of favorable oxidation states of metal ions. The results were confirmed by electrical property analysis of the Li-doped IZO TFTs. For Li content varied from 0 to 16.6 at.%, the highest field-effect mobility, on/off current ratio, subthreshold slope and stress bias stability were obtained for Li-doping concentration of 9.0 mol%. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:19 / 23
页数:5
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