Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

被引：42

作者：

Hau-Riege, S. P. ^{[1
]}

London, R. A. ^{[1
]}

Graf, A. ^{[1
]}

Baker, S. L. ^{[1
]}

Soufli, R. ^{[1
]}

Sobierajski, R. ^{[2
,3
]}

Burian, T. ^{[4
]}

Chalupsky, J. ^{[4
,5
]}

Juha, L. ^{[4
]}

Gaudin, J. ^{[6
]}

Krzywinski, J. ^{[7
]}

Moeller, S. ^{[7
]}

Messerschmidt, M. ^{[7
]}

Bozek, J. ^{[7
]}

Bostedt, C. ^{[7
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland

[3] FOM Inst Plasma Phys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands

[4] Acad Sci Czech Republic, Inst Phys, Prague 18221 8, Czech Republic

[5] Czech Tech Univ, Fac Nucl Sci & Phys Engn, CR-11519 Prague 1, Czech Republic

[6] European XFEL GmbH, D-22761 Hamburg, Germany

[7] SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA

来源：

OPTICS EXPRESS | 2010年 / 18卷 / 23期

关键词：

D O I：

10.1364/OE.18.023933

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 mu J and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays. (C) 2010 Optical Society of America

引用

页码：23933 / 23938

页数：6

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