Segregation of alloying elements in passive systems - I. XPS studies on the Ni-W system

被引：70
作者：
Zhang, L [1 ]
Macdonald, DD [1 ]
机构：
[1] Penn State Univ, Ctr Adv Mat, University Pk, PA 16802 USA
来源：
ELECTROCHIMICA ACTA | 1998年 / 43卷 / 18期
关键词：
D O I：
10.1016/S0013-4686(97)00268-5
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A method has been developed for analyzing XPS depth profiles to quantify the segregation of alloying elements in passive systems, for determining the relative extents of selective dissolution and selective oxidation of the alloying elements, and for understanding the mechanisms involved. A sputter kinetic model is proposed to correct depth profiles when preferential sputtering occurs. Analysis of XPS depth profiles for a passivated Ni-W (5.86%) alloy has been performed to illustrate the method. (C) 1998 Elsevier Science Ltd. All rights reserved.
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页码：2661 / 2671
页数：11
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