Single-electron tunneling in InP nanowires

被引:125
作者
De Franceschi, S
van Dam, JA
Bakkers, EPAM
Feiner, LF
Gurevich, L
Kouwenhoven, LP
机构
[1] Delft Univ Technol, Dept NanoSci, NL-2600 GA Delft, Netherlands
[2] Delft Univ Technol, ERATO Mesoscop Correlat Project, NL-2600 GA Delft, Netherlands
[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词
D O I
10.1063/1.1590426
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the fabrication and electrical characterization of field-effect devices based on wire-shaped InP crystals grown from Au catalyst particles by a vapor-liquid-solid process. Our InP wires are n-type doped with diameters in the 40-55-nm range and lengths of several micrometers. After being deposited on an oxidized Si substrate, wires are contacted individually via e-beam fabricated Ti/Al electrodes. We obtain contact resistances as low as similar to10 kOmega, with minor temperature dependence. The distance between the electrodes varies between 0.2 and 2 mum. The electron density in the wires is changed with a back gate. Low-temperature transport measurements show Coulomb-blockade behavior with single-electron charging energies of similar to1 meV. We also demonstrate energy quantization resulting from the confinement in the wire. (C) 2003 American Institute of Physics.
引用
收藏
页码:344 / 346
页数:3
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