First-order reversal curve diagram and its application in investigation of polarization switching behavior of HfO2-based ferroelectric thin films

From physical point of view, the "0, 1" read/write operation of ferroelectric memory is based on the polarization switching of ferroelectric memory. Therefore, the reliability of device relies directly on the stability of polarization switching behavior. The polarization behaviors of HfO2-based ferroelectric thin films subjected to bipolar cyclic electric field often exhibit wake-up, fatigue and split-up of transient switching current. These unstable switching properties seriously restrict the practical application of this new-type ferroelectric material in memory devices. It therefore becomes the critical task to explore the mechanism behind the complex evolution of polarization switching and find out possible approaches to optimizing the stability. However, it will be extremely difficult to accomplish the task by the traditional characterization methods. First-order reversal curve (FORC) diagram is regarded as "fingerprint identification" in the study of hysteresis systems, and has been used successfully to analyze the characteristic parameters of magnetic materials. The FORC diagram can intuitively determine the type, size and domain status of magnetic particles from distribution of both coercive field and interaction field. Moreover, it is also found that the FORC diagram is sensitive to measuring temperature. In this work, first, the Preisach model and implementation method of the FORC diagram are introduced. Then using Keithley 4200-SCS equipped with a remote pulse measurement unit, 60 FORCs are recorded for Si-doped HfO2 ferroelectric thin films experiencing different external field loading histories. By the mathematical treatment, switching density distributions determined by FORC measurements are obtained to explore the evolution of coercive field and bias field. The FORC diagram of pristine film contains three distribution regions with different bias fields, which merge into one distribution with an almost zero bias field after 10(4) wake-up cycles. Two oppositely biased regions can be observed after 2 x 10(9) sub-cycling treatments. Surprisingly, the bias fields nearly vanish again after 10(4) wake-up cycles. The main change of bias field instead of coercive field indicates that the migration of oxygen vacancies is likely to be the dominant mechanism behind the complex polarization switching behavior for HfO2-based ferroelectric thin films.