Influence of the vacuum deposition conditions on the microstructure of thin As-S films

The preparation of crystalline As-S films have been studied and some basic experimental conditions for epitaxial growth applied. Films were deposited from As2S3 vacuum evaporated from a Ta-crucible on air cleaved NaCl single crystal and Ca-Na silicate glass. It was established that condensation of As2S3 on air-cleaved NaCl single crystals at very low deposition rates resulted in thin films with a crystalline microstructure. The composition of the crystalline phase differs from the stoichiometric As/S ratio and strongly depends on the film thickness, deposition rate, type and substrate temperature. From the results obtained the importance is discusses' of the vacuum deposition conditions needed to prepare thin films with desired structural characteristics. (C) 1998 Elsevier Science Ltd. All rights reserved.