A Planarized Thermophotovoltaic Emitter With Idealized Selective Emission

被引:27
作者
Fu, Sze Ming [1 ]
Zhong, Yan Kai [1 ]
Tu, Ming Hsiang [1 ]
Chen, Bo Ruei [1 ]
Lin, Albert [1 ]
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 30010, Taiwan
来源
IEEE PHOTONICS JOURNAL | 2016年 / 8卷 / 04期
关键词
Photovoltaics (PV); optical properties of photonic materials; metamaterial; thin film coatings; DETAILED BALANCE LIMIT; SOLAR-CELLS; LIGHT-ABSORPTION; SILICON;
D O I
10.1109/JPHOT.2016.2594704
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Compared with conventional solar cells, thermophotovoltaics (TPV) can be more efficient and, thus, exceeds the detailed balance efficiency limit. In particular, the emitter of TPV is a critical design since it determines whether the thermalization loss can be reduced and whether the sub-band-gap radiation can be suppressed, as far as the photovoltaic (PV) process is concerned. In this paper, we propose a selective planar emitter composed of alternating ultrathin metal and dielectric layers. An aperiodic dielectric stacking is designed to tailor the emission spectrum by shaping the emission peak and by adjusting the emission wavelength. We show that the peak emission wavelength (lambda(emission)) is adjustable from lambda = 1500 nm to lambda = 2500 nm. Furthermore, the long-wavelength cutoff is very sharp for our proposed emitter structure, and the absorption is suppressed to 0.1 beyond the cutoff. The preliminary experiment is also conducted to fulfill the concept of a fully planar ultrathin refractory metal emitter design, and the result is similar to the calculated ones. We believe that the planar thermal emitter based on ultrathin metals and aperiodic dielectric stacking is very promising for future thermal emission applications since it requires no lithography and etching, provides strong peak emission power, and possesses wide wavelength scalability.
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页数:9
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