Selective incorporation of perfluorinated phenyl rings during pulsed plasma polymerization of perfluoroallylbenzene

被引：27
作者：
Hynes, A [1 ]
Badyal, JPS [1 ]
机构：
[1] Univ Durham, Sci Labs, Dept Chem, Durham DH1 3LE, England
来源：
CHEMISTRY OF MATERIALS | 1998年 / 10卷 / 08期
关键词：
D O I：
10.1021/cm9800682
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Pulsed plasma polymerization of perfluoroallylbenzene can lead to the deposition of films containing high concentrations of perfluorinated phenyl groups. X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and deposition rate measurements have shown that low duty cycles give rise to minimal precursor fragmentation accompanied by conventional free radical polymerization during the off-period.
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页码：2177 / 2182
页数：6
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