Temperature dependency and carrier transport mechanisms of Ti/p-type InP Schottky rectifiers

被引:88
作者
Janardhanam, V. [2 ]
Lee, Hoon-Ki [1 ]
Shim, Kyu-Hwan [1 ]
Hong, Hyo-Bong [3 ]
Lee, Soo-Hyung [3 ]
Ahn, Kwang-Soon [4 ]
Choi, Chel-Jong [1 ,2 ]
机构
[1] Chonbuk Natl Univ, Sch Semicond & Chem Engn, SPRC, Jeonju 561756, South Korea
[2] Chonbuk Natl Univ, Dept BIN Fus Technol, Jeonju 561756, South Korea
[3] ETRI, Future Technol Res Grp, Taejon 305700, South Korea
[4] Yeungnam Univ, Sch Display & Chem Engn, Gyongsan 712749, South Korea
关键词
Schottky contacts; I-V-T characteristics; InP; Ti; Frenkel-Poole emission; Schottky emission; BARRIER DIODES; INTERFACIAL LAYER; CONTACTS; JUNCTIONS; EPITAXY; HEIGHT;
D O I
10.1016/j.jallcom.2010.05.074
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the temperature dependent current-voltage (I-V) characteristics of Ti Schottky contacts to p-type InP. The Ti/p-type InP Schottky diode yielded an ideality factor of 1.08 showing good rectifying behavior with a barrier height of 0.73 eV at 300 K. The capacitance-voltage (C-V) characteristics of the Ti Schottky contact to p-type InP have been measured at room temperature and at different frequencies. The barrier heights from C-V measurements are calculated to be 0.71, 0.72 and 0.77 eV at 10 kHz, 100 kHz and I MHz, respectively. The discrepancy of barrier heights obtained from I-V at 300 K and C-V characteristics measured at f = 1 MHz at 300 K is negligible due to homogenous nature of Schottky diode structures. The characteristic energy of the diode at 300 K showed thermionic emission to be the dominating current mechanism. The analysis of the reverse current-voltage characteristics of the Ti Schottky contact to p-type InP reveals that the main process involved in leakage current could be associated with the Frenkel-Poole emission at 300 K, while at 350 K and 400 K, the Schottky emission. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:146 / 150
页数:5
相关论文
共 24 条
[1]   Barrier characteristics of Cd/p-GaTe Schottky diodes based on I-V-T measurements [J].
Abay, B ;
Çankaya, G ;
Güder, HS ;
Efeoglu, H ;
Yogurtçu, YK .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2003, 18 (02) :75-81
[2]   Determination of the laterally homogeneous barrier height of metal/p-InP Schottky barrier diodes [J].
Asubay, S. ;
Gullu, O. ;
Turut, A. .
VACUUM, 2009, 83 (12) :1470-1474
[3]   Current-voltage and capacitance-voltage characteristics of polypyrrole/p-InP structure [J].
Aydogan, S ;
Saglam, M ;
Türüt, A .
VACUUM, 2005, 77 (03) :269-274
[4]   A transistor performance figure-of-merit including the effect of gate resistance and its application to scaling to sub-0.25-μm CMOS logic technologies [J].
Chatterjee, A ;
Rodder, M ;
Chen, IC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (06) :1246-1252
[5]   Examination by interfacial layer and inhomogeneous barrier height model of temperature-dependent I-V characteristics in Co/p-InP contacts [J].
Ejderha, K. ;
Yildirim, N. ;
Abay, B. ;
Turut, A. .
JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 484 (1-2) :870-876
[6]   High-temperature characteristics of SiC Schottky barrier diodes related to physical phenomena [J].
Funaki, Tsuyoshi ;
Kimoto, Tsunenobu ;
Hikihara, Takashi .
IEICE ELECTRONICS EXPRESS, 2008, 5 (06) :198-203
[7]   Temperature dependent barrier characteristics of CrNiCo alloy Schottky contacts on n-type molecular-beam epitaxy GaAs [J].
Gümüs, A ;
Türüt, A ;
Yalçin, N .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (01) :245-250
[8]   ELECTRICAL PROPERTIES OF NICKEL-LOW-DOPED N-TYPE GALLIUM-ARSENIDE SCHOTTKY-BARRIER DIODES [J].
HACKAM, R ;
HARROP, P .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (12) :1231-+
[9]  
HAN CH, 1991, IEEE ELECTR DEVICE L, V12, P74, DOI 10.1109/55.75708
[10]   A NEW METHOD TO FABRICATE AU/N-TYPE INP SCHOTTKY CONTACTS WITH AN INTERFACIAL LAYER [J].
HATTORI, K ;
TORII, Y .
SOLID-STATE ELECTRONICS, 1991, 34 (05) :527-531