Stability Limit of Water by Metastable Vapor-Liquid Equilibrium with Nanoporous Silicon Membranes

被引:20
作者
Chen, I-Tzu [1 ]
Sessoms, David A. [1 ]
Sherman, Zachary [1 ]
Choi, Eugene [1 ]
Vincent, Olivier [1 ]
Stroock, Abraham D. [1 ,2 ]
机构
[1] Cornell Univ, Robert Frederick Smith Sch Chem & Biomol Engn, Ithaca, NY 14853 USA
[2] Cornell Univ, Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
NEGATIVE-PRESSURE; SUPERCOOLED WATER; TENSILE-STRENGTH; CAVITATION; DENSITY; TEMPERATURE; NUCLEATION; SURFACES; LAYERS;
D O I
10.1021/acs.jpcb.6b01618
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Liquid can sustain mechanical tension as its pressure drops below the vapor liquid coexistence line and becomes less than zero, until it reaches the stability limit the pressure at which cavitation inevitably occurs. For liquid water, its stability limit is Stilt a subject of debate: the results obtained by researchers using a variety of techniques show discrepancies between the values of the stability Limit and its temperature dependence as temperature approaches 0 degrees C. In this work, we present a study of the stability limit of water by the metastable vapor liquid equilibrium, (MVLE) method with nanoporous silicon membranes. We also report on an experimental system which enables tests of the temperature dependence of the stability limit with MVLE. The stability limit we found increases monotonically (larger tension) as temperature approaches 0 degrees C; this trend contradicts the centrifugal result of Briggs but agrees with the experiments by acoustic cavitation. This result confirms that a quasi-static method can reach stability values similar to that from the dynamic stretching technique, even close to 0 degrees C. Nevertheless, our results fall in the range of similar to -20 to -30 MPa, a range that is consistent with the majority of experiments but is far less negative than the limit obtained in experiments involving quartz inclusions and that predicted for homogeneous nucleation.
引用
收藏
页码:5209 / 5222
页数:14
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