Infrared steam laser cleaning

被引:13
作者
Frank, P. [1 ]
Lang, F. [1 ]
Mosbacher, M. [1 ]
Boneberg, J. [1 ]
Leiderer, P. [1 ]
机构
[1] Univ Konstanz, D-78457 Constance, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2008年 / 93卷 / 01期
关键词
D O I
10.1007/s00339-008-4651-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Steam Laser Cleaning with a pulsed infrared laser source is investigated. The infrared light is tuned to the absorption maximum of water (lambda=2.94 mu m, 10 ns), whereas the substrates used are transparent (glass, silicon). Thus a thin liquid water layer condensed on top of the contaminated substrate is rapidly heated. The pressure generated during the subsequent phase explosion generates a cleaning force which exceeds the adhesion of the particles. We examine the cleaning threshold in single shot experiments for particles sized from 1 mu m down to 300 nm.
引用
收藏
页码:1 / 4
页数:4
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