Characterization of soft-X-ray detectors fabricated with high-quality CVD diamond thin films

被引:17
作者
Iwakaji, Y. [1 ]
Kanasugi, M. [1 ]
Maida, O. [1 ]
Takeda, Y.
Saitoh, Y. [2 ]
Ito, T. [1 ]
机构
[1] Osaka Univ, Grad Sch Engn, Div Elect Elect & Informat Engn, Suita, Osaka 5650871, Japan
[2] JAEA SPring 8, Sayo, Hyogo 6795148, Japan
关键词
diamond film; plasma CVD; detectors; electrical properties characterization;
D O I
10.1016/j.apsusc.2008.02.156
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have characterized the performance of soft-X-ray detectors fabricated with undoped and B-doped homoepitaxial diamond layers of high quality which were grown on a commercially available type Ib (1 0 0) substrate by means of a high-power microwave-plasma chemical-vapor-deposition (CVD) method. The signal currents of the diamond-based detectors with thin TiN electrodes formed vertically (along the homoepitaxial growth direction) were measured at room temperature as a function of the applied voltage, V(a), for irradiations of 500-1200 eV soft-X-ray beams ranging from approximate to 6 x 10(9) to approximate to 1 x 10(11) photons/s. The deduced apparent quantum efficiencies increased with the increasing V(a) and reached to 2.5 x 10(3) at V(a) = 60 V. As expected from the device structure, the detector performance depended only very slightly on the applied magnetic field up to 10 T. The excellently high sensitivities attained for soft-X-ray photons are discussed in relation to carrier amplification mechanisms which invested the above diamond detectors. (C) 2008 Elsevier B. V. All rights reserved.
引用
收藏
页码:6277 / 6280
页数:4
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