Momentum-imaging spectroscopy of secondary ions from GaN and SiC surfaces collided with highly charged ions at grazing angle

被引:10
作者
Motohashi, K
Tsurubuchi, S
Koukitu, A
机构
[1] Tokyo Univ Agr & Technol, Dept Appl Phys, Tokyo 1848588, Japan
[2] Tokyo Univ Agr & Technol, Dept Appl Chem, Tokyo 1848588, Japan
关键词
highly charged ions; wide-gap semiconductors; potential sputtering; grazing-incidence; momentum images; secondary ions;
D O I
10.1016/j.nimb.2005.03.054
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Three-dimensional momentum of sputtered ions were measured in coincidence with scattered Ar atoms in collisions between Arq+ (q = 3, 8, 11, and 14) and 6H-SiC and GaN surfaces at grazing-incidence angle (< 0.50). H+, H-2(+), Si+ and Ga+ ions were observed in time-of-flight-mass spectra. Sputtering yields of H+ and H-2(+) increased with increasing charge states of incident ions in proportion to q(4). The momenta of these secondary ions emitted from the surfaces were intensively distributed to the direction of surface normal in spite of the grazing collisions. Almost no significant change among different q was found in the kinetic energy distributions of these secondary ions. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:254 / 260
页数:7
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