The influence of experimental procedures on the structural and magnetic properties of RF sputtered Fe-N thin films

被引：9

作者：

Du, HM

Wu, P ^{[1
]}

Jiang, EY

Li, ZQ

Zhao, C

Bai, HL

机构：

[1] Tianjin Univ, Fac Sci, Inst Adv Mat Phys, Tianjin Key Lab Low Dimens Mat Phys & Preparing T, Tianjin 300072, Peoples R China

[2] Tianjin Univ, Key Lab Adv Ceram & Machining Technol Minist Educ, Tianjin 300072, Peoples R China

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2005年 / 292卷 / 292期

基金：

中国国家自然科学基金;

关键词：

Fe-N thin films; phase evolution; coercive force; magnetic anisotropy;

D O I：

10.1016/j.jmmm.2004.10.115

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fe-N thin films were fabricated on Si (100) by RF magnetron sputtering. The dependence of the structural and magnetic properties with varied nitrogen partial pressure (P-N2), RF power and film thickness were systematically studied. The phase evolution from alpha-Fe(N) to xi-Fe2N with increase of nitrogen partial pressure was seen. alpha"-Fe16N2 existed in the whole range of the nitrogen partial pressure. The research of in-plane magnetic anisotropy with different nitrogen partial pressure indicated that interstitial nitrogen atoms affected in-plane magnetic anisotropy in Fe-N system. With the increase of the film thickness from 50 to 730 nm, the saturated magnetization (M-s) decreases and the coercive force (H-c) increases. The good soft magnetic properties with M-s of 2223 emu/cm(3) and H-c of 4 Oe were obtained at the optimized parameters of P-N2, RF power and film thickness. (c) 2004 Elsevier B.V. All rights reserved.

引用

页码：227 / 233

页数：7

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