Optical properties and deposition rate of sputtered Ta2O5 films deposited by ion-beam oxidation

被引：23
|
作者：
Lee, CC [1 ]
Jan, DJ
机构：
[1] Natl Cent Univ, Inst Opt Sci, Chungli 320, Taiwan
[2] Inst Nucl Energy Res, Plasma Technol Promot Ctr, Taoyuan 325, Taiwan
来源：
THIN SOLID FILMS | 2005年 / 483卷 / 1-2期
关键词：
ion bombardment; optical properties; tantalum;
D O I：
10.1016/j.tsf.2004.12.050
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Tantalum oxide films deposited by DC magnetron sputtering in the transition mode and ion-beam oxidation (1130) at room temperature showed that the deposition rate of the IBO film was four times higher than that obtained by conventional reactive magnetron sputtering, and was correlated with the oxygen ratio, X(O2)=O(2)/(O(2)+Ar), in the ion beam. The results of Rutherford backscattering and X-ray photoelectron spectroscopy indicated that the films deposited by IBO with various ion energy had the same composition and chemical bonding; the refractive index changed with the ion energy. The Fourier transform infrared absorption spectra indicated that the films deposited by IBO had excellent moisture-resistant characteristics. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：130 / 135
页数：6
相关论文
共 50 条
  • [41] Residual stress and laser-induced damage of ion-beam sputtered Ta2O5/SiO2 mixture coatings
    Qiao, Zhao
    Pu, Yunti
    Liu, Hao
    Luo, Kang
    Wang, Gang
    Liu, Zhichao
    Ma, Ping
    THIN SOLID FILMS, 2015, 592 : 221 - 224
  • [42] Structural and Optical Properties of Sol-Gel Deposited Proton Conducting Ta2O5 Films
    Nilgun Ozer
    Carl M. Lampert
    Journal of Sol-Gel Science and Technology, 1997, 8 : 703 - 709
  • [43] Structural properties of Ta2O5 deposited films using atomistic modeling
    Grigoriev, F. V.
    Sulimov, V. B.
    Kutov, D. C.
    Tikhonravov, A. V.
    APPLIED OPTICS, 2025, 64 (02) : 369 - 376
  • [44] Structural and optical properties of sol-gel deposited proton conducting Ta2O5 films
    Ozer, N
    Lampert, CM
    JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 1997, 8 (1-3) : 703 - 709
  • [45] Structure and properties of SiO2 and Ta2O5 films deposited by ion-plasma sputtering
    Ignatenko, P.I.
    Goncharov, A.A.
    Kudelin, Yu.V.
    Fizika i Khimiya Obrabotki Materialov, 1992, (04): : 148 - 150
  • [46] Structural and optical properties of sol-gel deposited proton conducting Ta2O5 films
    Nilgun Ozer
    Carl M. Lampert
    Journal of Sol-Gel Science and Technology, 1997, 8 : 703 - 709
  • [47] The structural nature of SiO2/Ta2O5 multilayers on Si(100) formed by ion-beam sputter deposition
    Kojima, I
    Li, BQ
    Fujimoto, T
    Kim, KJ
    Moon, DW
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (15) : 2143 - 2146
  • [48] Post-annealing effects on the structural properties and residual stress of Ta2O5 thin films deposited by ion beam sputtering
    Yoon, S. G.
    Kang, S. M.
    Yoon, D. H.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2007, 9 (05): : 1246 - 1249
  • [49] Influence of substrate temperature on the structural, dielectric and optical properties of RF magnetron sputtered Ta2O5 films
    Uthanna, S.
    Chandra, S. V. Jagadeesh
    Rao, G. Mohan
    Pierson, J. F.
    FUNDAMENTALS AND TECHNOLOGY OF MULTIFUNCTIONAL OXIDE THIN FILMS (SYMPOSIUM G, EMRS 2009 SPRING MEETING), 2010, 8
  • [50] Optimization of reactive ion beam sputtered Ta2O5 for III-V compounds
    Reuna, Jarno
    Vuorinen, Marianna
    Isoaho, Riku
    Aho, Arto
    Makela, Severi
    Hietalahti, Arttu
    Anttola, Elina
    Tukiainen, Antti
    Guina, Mircea
    THIN SOLID FILMS, 2022, 763
12345