Bandwidth estimation for ultra-high-speed lithium niobate modulators

被引：42

作者：

Haxha, S ^{[1
]}

Rahman, BMA ^{[1
]}

Grattan, KTV ^{[1
]}

机构：

[1] City Univ London, Sch Engn & Math Sci, London EC1V 0HB, England

来源：

APPLIED OPTICS | 2003年 / 42卷 / 15期

关键词：

D O I：

10.1364/AO.42.002674

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The effects of velocity matching, impedance matching, conductor loss, and dielectric loss on the optical bandwidth of an ultra-high-speed lithium niobate modulator are reported. It is shown that both dielectric loss and impedance matching play a key role for velocity-matched high-speed modulators with low conductor loss. The effects of etch depth, buffer thickness, electrode width, and the gap between the electrodes on device performance are also illustrated. (C) 2003 Optical Society of America.

引用

页码：2674 / 2682

页数：9

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