Ab Initio Molecular Dynamics Simulation of Ethylene Reaction on Nickel (111) Surface

被引:25
作者
Arifin, Rizal [1 ,3 ]
Shibuta, Yasushi [2 ]
Shimamura, Kohei [1 ]
Shimojo, Fuyuki [1 ]
Yamaguchi, Shu [2 ]
机构
[1] Kumamoto Univ, Dept Phys, Chuo Ku, Kumamoto 8608555, Japan
[2] Univ Tokyo, Dept Mat Engn, Bunkyo Ku, Tokyo 1138656, Japan
[3] Univ Muhammadiyah Ponorogo, Fac Engn, Ponorogo 63471, Indonesia
关键词
GRAPHENE GROWTH; DISSOCIATION; ADSORPTION; ACETYLENE; NI(111); METHANE; STAGE; NI;
D O I
10.1021/jp512148b
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We performed ab initio molecular dynamics (MD) simulations of ethylene molecules on the nickel (111) surface to understand the initial stage of graphene growth via a chemical vapor deposition process. Several hydrogen atoms are dissociated from ethylene molecules during the MD simulations in three different reaction mechanisms. It is seen that the ethylene molecules are easily chemisorbed on the nickel surface. This chemisorption contributes significantly to the dissociation reactions of ethylene molecules on the nickel (111) surface. Furthermore, it is found from additional MD simulations that carbon atoms diffuse more easily into the nickel subsurface than carbon dimers.
引用
收藏
页码:3210 / 3216
页数:7
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