Novel polymers to study the influence of the azobenzene content on the photo-induced surface relief grating formation

被引:27
作者
Börger, V
Kuliskovska, O
Hubmann, KG
Stumpe, J
Huber, M
Menzel, H
机构
[1] Tech Univ Carolo Wilhelmina Braunschweig, Inst Tech Chem, D-38106 Braunschweig, Germany
[2] Inst Thin Film Technol & Microsensor, D-14513 Teltow, Germany
[3] Univ Potsdam, D-14415 Potsdam, Germany
[4] Fraunhofer Inst Appl Polymer Res, D-14476 Potsdam, Germany
[5] Univ Bayreuth, Inst Phys, D-95440 Bayreuth, Germany
[6] Univ Bayreuth, Bayreuther Inst Makromol Forsch, D-95440 Bayreuth, Germany
关键词
azo polymers; holography; photochemistry; surface relief gratings; UV-vis spectroscopy;
D O I
10.1002/macp.200500147
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The influence of the azobenzene concentration on the photo-induced surface relief grating (SRG) formation in polymer films was investigated. Two series of polymers with 4-alkoxy-4'-cyanoazobenzene side groups were synthesized. In series A, the degree of substitution was varied, while in series B, azobenzene and biphenyl groups were introduced in varying composition, but the concentration of non-reacted HEMA-groups was kept constant. Photo-induction of the dichroism and the SRG was studied as function of the azobenzene concentration. An optimum was found for the SRG formation (76%), while the highest dichroism was induced at the lowest azobenzene concentration of 20%. The restriction of rotational and translational molecular motions observed at higher azobenzene concentration was explained by pi-pi stacking of the azobenzene moieties and interaction of unreacted HEMA groups.
引用
收藏
页码:1488 / 1496
页数:9
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