Electrical properties of novel anodic films formed in nonaqueous electrolyte solutions

被引:0
|
作者
Mizutani, F [1 ]
Takeuchi, S [1 ]
Nishiwaki, T [1 ]
Sato, N [1 ]
Ue, M [1 ]
机构
[1] Mitsubishi Chem Corp, Tsukuba Res Ctr, Ibaraki, Osaka 3000397, Japan
来源
ELECTRICALLY BASED MICROSTRUCTURAL CHARACTERIZATION II | 1998年 / 500卷
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An aluminum alloy (Al - 1.0% Si - 0.5% Cu) was anodized in nonaqueous electrolyte solutions containing propylene carbonate (PC), ethylene glycol (EG), or gamma-butyrolactone (GBL) as a solvent. MIM (metal-insulator-metal) elements using these anodic films were made to evaluate their electrical properties. Leakage current of the anodic films formed in the nonaqueous solutions was lower than those formed in aqueous electrolyte solutions. These novel films are useful as a high insulating film used for a gate insulator in thin film transistor liquid crystal displays (TFT-LCD).
引用
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页码:113 / 118
页数:6
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