Enhanced Free Exciton and Direct Band-Edge Emissions at Room Temperature in Ultrathin ZnO Films Grown on Si Nanopillars by Atomic Layer Deposition

被引:26
作者
Chang, Yuan-Ming [1 ]
Shieh, Jiann [3 ]
Chu, Pei-Yuan [1 ]
Lee, Hsin-Yi [2 ,4 ]
Lin, Chih-Ming [5 ]
Juang, Jenh-Yih [1 ]
机构
[1] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[3] Natl United Univ, Dept Mat Sci & Engn, Miaoli 360, Taiwan
[4] Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[5] Natl Hsinchu Univ Educ, Dept Appl Sci, Hsinchu 300, Taiwan
关键词
ultrathin; ZnO; Si nanopillars; atomic layer deposition; free exciton; OPTICAL-PROPERTIES; QUANTUM DOTS; ZINC-OXIDE; ULTRAVIOLET; PHOTOLUMINESCENCE;
D O I
10.1021/am201062t
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Room-temperature ultraviolet (UV) luminescence was investigated for the atomic layer deposited ZnO films grown on silicon nanopillars (Si-NPs) fabricated by self-masking dry etching in hydrogen-containing plasma. For films deposited at 200 degrees C, an intensive UV emission corresponding to free-exciton recombination (similar to 3.31 eV) was observed with a nearly complete suppression of the defect-associated broad visible range emission peak. On the other hand, for ZnO films grown at 25 degrees C, albeit the appearance of the defect-associated visible emission, the UV emission peak was observed to shift by similar to 60 meV to near the direct band edge (3.37 eV) recombination emission. The high-resolution transmission electron microscopy (HRTEM) showed that the ZnO films obtained at 25 degrees C were consisting of ZnO nanocrystals with a mean radius of 2 nm embedded in a largely amorphous matrix. Because the Bohr radius of free-exictons in bulk ZnO is similar to 2.3 nm, the size confinement effect may have occurred and resulted in the observed direct band edge electron-hole recombination. Additionally, the results also demonstrate order of magnitude enhancement in emission efficiency for the ZnO/Si-NP structure, as compared to that of ZnO directly deposited on Si substrate under the same conditions.
引用
收藏
页码:4415 / 4419
页数:5
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