High power nitride laser diodes grown by plasma assisted molecular beam epitaxy

被引:10
|
作者
Muziol, G. [1 ]
Siekacz, M. [1 ,2 ]
Turski, H. [1 ]
Wolny, P. [1 ]
Grzanka, S. [1 ,2 ]
Grzanka, E. [1 ,2 ]
Feduniewicz-Zmuda, A. [1 ]
Borysiuk, J. [3 ,4 ]
Sobczak, K. [3 ]
Domagala, J. [3 ]
Nowakowska-Siwinska, A. [2 ]
Makarowa, I. [2 ]
Perlin, P. [1 ,2 ]
Skierbiszewski, C. [1 ,2 ]
机构
[1] Inst High Pressure Phys, PL-01142 Warsaw, Poland
[2] TopGaN Ltd, PL-01142 Warsaw, Poland
[3] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[4] Univ Warsaw, Fac Phys, PL-02093 Warsaw, Poland
关键词
Molecular beam epitaxy; Nitrides; Laser diodes;
D O I
10.1016/j.jcrysgro.2015.02.067
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The influence of waveguide design on performance of nitride based laser diodes (LDs) grown by plasma assisted molecular beam epitaxy is studied. A large improvement in threshold current density and slope efficiency of LDs is observed when an InGaN interlayer with 8% In content is introduced between multi-quantum-well region and electron blocking layer. This dependence is attributed to reduction of internal losses due to lower optical mode overlap with highly absorptive Mg-doped layers. This led to demonstration of blue LD operating at lambda=450 nm with high optical power of 500 mW per facet. (C) 2015 Elsevier B.V. All rights reserved
引用
收藏
页码:398 / 400
页数:3
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