共 50 条
- [21] Tungsten allylimido complexes CI4(RCN)W(NC3H 5) as single-source CVD precursors for WNχC γ thin films. Correlation of precursor fragmentation to film properties Anderson, T.J. (tim@ufl.edu), 1600, American Chemical Society (127):
- [22] Chemical vapor deposition of metal oxide thin films and new single-source precursor design for oxynitride films. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2005, 229 : U1069 - U1069
- [23] Optical properties of thin CVD-tungsten oxide films by spectroscopic ellipsometry Journal of Crystal Growth, 1999, 198-199 (pt 2): : 1235 - 1239
- [25] Synthesis and Characterization of Tungsten oxide Electrochromic Thin Films 2018 IEEE 18TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO), 2018,
- [26] CVD of high-k dielectric thin films. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U463 - U463
- [30] Preparation of manganese oxide thin films. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U1456 - U1456