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A numerical study of carrier impact ionization in AlxGa1-xN
被引:50
作者:
Bellotti, Enrico
[1
]
Bertazzi, Francesco
[1
,2
,3
]
机构:
[1] Boston Univ, Dept ECE, Boston, MA 02215 USA
[2] Politecn Torino, Dipartimento Elettron, I-10129 Turin, Italy
[3] Politecn Torino, IEIIT CNR, I-10129 Turin, Italy
关键词:
MONTE-CARLO CALCULATION;
NONLOCAL PSEUDOPOTENTIAL CALCULATION;
PHASE MATERIALS SYSTEM;
BAND-STRUCTURE;
BULK ZINCBLENDE;
ELECTRIC-FIELD;
GAN;
SEMICONDUCTORS;
TRANSPORT;
RATES;
D O I:
10.1063/1.4719967
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Using a full-band Monte Carlo model we have computed the carrier impact ionization coefficients in AlxGa1-xN for seven alloy compositions between x = 0 (GaN) and x = 1.0 (AlN). We have found that holes dominate the impact ionization process for compositions below 50%, while electrons dominate for larger aluminum contents. The model also predicts that, due to the particular features of the AlxGa1-xN valence band structure, holes impact ionization processes are effectively negligible for aluminum composition above 60%. Furthermore, we find that the electron-alloy scattering significantly reduces the electron ionization coefficients leading to the dominant behavior of holes in for an aluminum composition below 50%. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1.063/1.4719967]
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