Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

被引：1

作者：

Bogdanov, R. V. ^{[1
]}

Kostiukevych, O. M. ^{[1
]}

机构：

[1] Taras Shevenko Natl Univ Kyiv, Fac Radio Phys Elect & Comp Syst, Kiev, Ukraine

来源：

MATERIALS SCIENCE-POLAND | 2015年 / 33卷 / 01期

关键词：

Monte Carlo computer simulation; magnetron sputtering; flux of particles; carbon; graphite target; energy of particles;

D O I：

10.1515/msp-2015-0001

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas) confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

引用

页码：82 / 94

页数：13

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