Structure, composition and residual stresses of magnesium fluoride thin films deposited by direct evaporation

被引:1
作者
Dumas, L
Robic, JY
Pauleau, Y
机构
[1] CEA, LETI, DOPT, F-38054 Grenoble 09, France
[2] Inst Natl Polytech Grenoble, ENSEEG, F-38402 St Martin Dheres, France
来源
TRENDS AND NEW APPLICATIONS OF THIN FILMS | 1998年 / 287-2卷
关键词
MgF2; electron beam evaporation; residual stresses; RES and X-ray characterization;
D O I
10.4028/www.scientific.net/MSF.287-288.255
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnesium fluoride films have been deposited on quartz and silicon substrates by direct electron beam evaporation. The structure, composition and mass density of films were investigated as functions of the deposition temperature ranging from 20 degrees C to 300 degrees C. The composition of films determined by infrared spectroscopy, and the residual stresses in films calculated from the change of the radius of curvature of Si substrates, were studied as functions of the aging time of films in room air and deposition temperature. The aging behavior is analysed and discussed in connection with the microstructure and mass density of films.
引用
收藏
页码:255 / 258
页数:4
相关论文
共 8 条
[1]   CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].
BRENNER, A ;
SENDEROFF, S .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123
[2]  
HIRRIEN B, 1997, THESIS INPG GRENOBLE
[3]   STRESS IN POROUS THIN-FILMS THROUGH ADSORPTION OF POLAR-MOLECULES [J].
HIRSCH, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1980, 13 (11) :2081-2094
[4]   MECHANICAL-PROPERTIES OF AND CRACKS AND WRINKLES IN VACUUM-DEPOSITED MGF2, CARBON AND BORON COATINGS [J].
KINBARA, A ;
BABA, S ;
MATUDA, N ;
TAKAMISAWA, K .
THIN SOLID FILMS, 1981, 84 (02) :205-212
[5]   STRUCTURE CORRELATED INFRARED PROPERTIES OF FLUORIDE FILMS [J].
LEHMANN, A ;
HEERDEGEN, W ;
SCHIRMER, G ;
MUTSCHKE, H ;
RICHTER, W ;
HACKER, E ;
DOHLE, R .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1990, 119 (02) :683-688
[6]   RESIDUAL-STRESSES IN EVAPORATED SILICON DIOXIDE THIN-FILMS - CORRELATION WITH DEPOSITION PARAMETERS AND AGING BEHAVIOR [J].
LEPLAN, H ;
GEENEN, B ;
ROBIC, JY ;
PAULEAU, Y .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (02) :962-968
[7]  
Pulker H. K., 1999, COATINGS GLASS
[8]  
STOLZ CJ, 1992, APPL OPTICS, V32, P5666