diamond;
catalyst;
chemical vapor deposition;
atomic force microscopy;
Raman spectroscopy;
D O I:
10.1016/j.carbon.2004.10.029
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The growth of a diamond film using low melting point coating of zinc on Si(1 0 0) substrate was investigated. The growth and surface morphology of the film and the substrate were investigated using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The quality of the film was investigated using Raman spectroscopy. The surface roughness of the sample film was 88 nm on silicon. The results show that the quality of the diamond film on the zinc covered surface is better than that directly on the scratched silicon substrate.