Facial Expression Recognition Using Residual Masking Network

被引:83
作者
Luan Pham [1 ]
The Huynh Vu [1 ]
Tuan Anh Tran [1 ,2 ]
机构
[1] Res Dept Cinnamon AI, Hanoi, Vietnam
[2] Ho Chi Minh City Univ Technol HCMUT, Fac Comp Sci & Engn, 268 Ly Thuong Kiet St,Dist 10, Ho Chi Minh City, Vietnam
来源
2020 25TH INTERNATIONAL CONFERENCE ON PATTERN RECOGNITION (ICPR) | 2021年
关键词
Facial Expression Recognition; Masking Idea; Residual Masking Network; DEEP;
D O I
10.1109/ICPR48806.2021.9411919
中图分类号
TP18 [人工智能理论];
学科分类号
081104 ; 0812 ; 0835 ; 1405 ;
摘要
Automatic facial expression recognition (FER) has gained much attention due to its applications in human-computer interaction. Among the approaches to improve FER tasks, this paper focuses on deep architecture with the attention mechanism. We propose a novel Masking Idea to boost the performance of CNN in facial expression task. It uses a segmentation network to refine feature maps, enabling the network to focus on relevant information to make correct decisions. In experiments, we combine the ubiquitous Deep Residual Network and Unet-like architecture to produce a Residual Masking Network. The proposed method holds state-of-the-art (SOTA) accuracy on the well-known FER2013 and private VEMO datasets.
引用
收藏
页码:4513 / 4519
页数:7
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