Surface microstructure and performance of TiN monolayer film on titanium bipolar plate for PEMFC

The influence of bias voltage on surface microstructure of TiN films deposited on Ti substrate by multi-arc ion plating was systematically investigated. The TiN films were characterized using X-ray diffraction, scanning electron microscopy and atomic force microscopy. The corrosion resistance was tested by potentiodynamic polarization and electrochemical impedance spectroscopy at 70-80 degrees C in the simulated PEMFC cathode environment. The results show that the surface microstructure of TiN film depends strongly on the bias voltages. At the bias voltage of -100 V, TiN film shows the optimum surface microstructure with the lowest surface roughness R-z of 0.039 mmtested by AFM and relatively high compactness. The optimized TiN film exhibits excellent corrosion resistance with corrosion current density of 0.87 mu A/cm(2) in a 0.5 M H2SO4 + 2 ppm HF solution at 80 degrees C with air and a low interfacial contact resistance (ICR) value of 3.0 mU cm(2) at a compaction force of 140 N/cm(2). These results support TiN as a promising coating material for Ti bipolar plates. (C) 2021 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.