Electrical resistivity and grain boundaries in metals

被引:43
作者
Nakamichi, I [1 ]
机构
[1] HIROSHIMA UNIV,FAC SCI,HIGASHIHIROSHIMA 739,JAPAN
来源
INTERGRANULAR AND INTERPHASE BOUNDARIES IN MATERIALS, PT 1 | 1996年 / 207-卷
关键词
electrical resistivity; grain boundary resistivity; grain boundary structure; dislocation; segregation; aluminum; aluminum-silver;
D O I
10.4028/www.scientific.net/MSF.207-209.47
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical resistivity measurements of a single grain boundary (GB) using Superconducting Quantum Interference Devices (SQUID) on zone-refined aluminum at 4.2 K have revealed that the intrinsic GB resistivity depends on the structure systematically. These give the following main conclusions: (1) GB resistivity is mainly caused by the electron scattering from the GB dislocation core region; and (2) a GB resistivity equation based on the primary dislocation model well explains the rotation angle dependence of specific GB resistivity for small-angle, large-angle and coincidence-related GBs, suggesting the good applicability of Read-Shockley model for these GBs, in consideration of the dislocation core overlap. The measurement on Al-Ag demonstrates that migrating GBs are associated with a much larger solute enhancement than equilibrium segregation. It suggests also that the solute resistivity becomes an order of magnitude smaller when segregated about GBs.
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页码:47 / 58
页数:12
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