Redeposition of sputtered material is a nonlinear effect

被引：28

作者：

Bradley, R. Mark ^{[1
]}

机构：

[1] Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA

来源：

PHYSICAL REVIEW B | 2011年 / 83卷 / 07期

关键词：

ION-BOMBARDMENT; SURFACES; EVOLUTION;

D O I：

10.1103/PhysRevB.83.075404

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

It is demonstrated that redeposition of sputtered material is a nonlinear effect in experiments on pattern formation induced by ion bombardment of solid surfaces. As a result, redeposition is not the physical mechanism responsible for the formation of the highly regular hexagonal arrays of nanodots sometimes produced by normal-incidence ion sputtering.

引用

页数：5

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