Novel lift-off technique for Transmission Electron Microscopy imaging of block copolymer films

被引：4

作者：

Roache, Fergus J. M. ^{[2
]}

Radjainia, Mazdak ^{[3
]}

Williams, David E. ^{[1
,2
]}

Gerrard, Juliet A. ^{[1
,2
,3
]}

Travas-Sejdic, Jadranka ^{[1
,2
]}

Malmstroem, Jenny ^{[1
,2
]}

机构：

[1] Univ Auckland, Sch Chem Sci, Auckland 1, New Zealand

[2] MacDiarmid Inst Adv Mat & Nanotechnol, Auckland, New Zealand

[3] Univ Auckland, Sch Biol Sci, Auckland 1, New Zealand

来源：

ULTRAMICROSCOPY | 2015年 / 150卷

关键词：

Block copolymer; Thin film; Nanopattern; Transmission Electron Microscopy; THIN-FILMS; NANOSTRUCTURE; ORIENTATION; MORPHOLOGY;

D O I：

10.1016/j.ultramic.2014.12.004

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

We have developed a simple technique to allow for the lift-off and subsequent transfer of poly(styrene-block-ethylene glycol) films to Transmission Electron Microscopy (TEM) grids. The block copolymer is spin coated onto carbon coated mica and annealed. After the thin film is produced it can easily be floated onto water and picked up by a TEM grid. This method offers better control over film processing than dip coating the TEM grid and is also a significant improvement over methods using etchants such as hydrofluoric acid. (C) 2014 Elsevier BM. All rights reserved.

引用

页码：71 / 73

页数：3

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