Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations

被引：0

作者：

Sasaki, Osami ^{[1
]}

Morimatsu, Takafumi ^{[1
]}

Choi, Samuel ^{[1
]}

Suzuki, Takamasa ^{[1
]}

机构：

[1] Niigata Univ, Fac Engn, Niigata 9502181, Japan

来源：

OPTICAL METROLOGY AND INSPECTION FOR INDUSTRIAL APPLICATIONS | 2010年 / 7855卷

关键词：

interferometer; wavelength scanning; sinusoidal phase modulation; thickness measurement; thin film; ACOUSTOOPTIC TUNABLE FILTER; THIN-FILM; PROFILE MEASUREMENT; SURFACE PROFILE;

D O I：

10.1117/12.871030

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Two light beams reflected from a front and rear surfaces of a glass film of 20 micron thickness interfere with each other in a common path interferometer. Sinusoidal wavelength-scanning light with the scanning amplitude of 5 nm and frequency of 15 KHz is used to generate a sinusoidal phase-modulated interference signal with the modulation amplitude of 2.6 rad. The phase of the interference signal provides the thickness variation of the film, whose measurement accuracy is a few nanometers. Moreover, in order to achieve a high spatial resolution and a wide measurement region a focused beam is scanned on the surface of the film with a rotating mirror.

引用

页数：6

共 5 条

[1] Sinusoidal wavelength-scanning interferometer using an acousto-optic tunable filter for measurement of thickness and surface profile of a thin film [J].